Semiconductor Metrology
LightPico revolutionizes semiconductor manufacturing with picometer-level precisionfor defect inspection, process control, and quality assurance. Achieve unprecedented accuracy in nanoscale measurements without destructive testing.
Semiconductor Industry Challenges
As semiconductor devices continue to shrink, traditional metrology and inspection methods struggle to meet the demanding requirements of modern fabrication processes.
Shrinking Feature Sizes
Advanced node processes require sub-10nm precision that challenges conventional optical metrology and demands expensive electron beam systems.
Destructive Testing
Electron microscopy and AFM techniques often damage samples, limiting their use for in-line process monitoring and quality control.
Throughput Demands
High-volume manufacturing requires rapid, automated inspection systems that current high-resolution techniques cannot provide.
LightPico Semiconductor Solutions
Our AI-driven optical microscopy delivers electron microscopy resolution while maintaining the speed, cost-effectiveness, and non-destructive nature of optical systems.
Advanced Node Metrology
Measure critical dimensions, line widths, and pattern fidelity at the 5nm node and below with λ/10000 precision. Our technology enables accurate characterization of features that challenge conventional optical systems.
Defect Detection & Classification
Identify and classify nanoscale defects in real-time without sample damage. Our AI algorithms distinguish between different defect types and provide quantitative analysis for process optimization.
In-Line Process Control
Monitor critical process parameters throughout fabrication with high-speed, non-destructive measurements. Enable real-time feedback for immediate process corrections and yield optimization.
Semiconductor Applications
LightPico technology addresses critical measurement needs across the semiconductor manufacturing process, from wafer inspection to device characterization.
Critical Dimension Metrology
Precise measurement of line widths, spacings, and feature dimensions for advanced lithography process control and yield optimization.
Defect Inspection
Automated detection and classification of nanoscale defects including particles, scratches, and pattern anomalies on wafers and masks.
Process Monitoring
Real-time monitoring of etch, deposition, and planarization processes to ensure consistent results and early problem detection.
Wafer-Level Packaging
Inspection and metrology for advanced packaging technologies including through-silicon vias (TSVs) and micro-bumps.
MEMS Devices
Characterization of microelectromechanical systems with precise measurement of mechanical structures and moving components.
Research & Development
Support for next-generation device development with ultra-high-resolution characterization capabilities for novel materials and structures.
Return on Investment
LightPico technology delivers significant cost savings and productivity improvements compared to traditional semiconductor metrology solutions.
Lower operating costs compared to electron microscopy systems through reduced maintenance, no vacuum requirements, and faster measurements.
Real-time measurements enable higher inspection rates and faster process feedback, significantly improving fab productivity.
Early defect detection and precise process control lead to measurable improvements in manufacturing yield and product quality.
Transform Your Semiconductor Manufacturing
Experience the future of semiconductor metrology with LightPico's revolutionary picometer-precision technology. Schedule a consultation with our technical experts.
Join leading semiconductor companies already using LightPico technology